发明名称 Plasma enhanced chemical vapor deposition system for forming carbon nanotubes
摘要 An embodiment of a system for forming carbon nanotubes (CNTs) using plasma enhanced chemical vapor deposition (PECVD) uses one or more of RF and DC power supplies coupled to electrodes in various configurations within a process chamber of the system. By application of a sufficient DC voltage to one or more electrodes, the system allows for growing CNTs that can be straighter and have improved electrical performance characteristics.
申请公布号 US2006008594(A1) 申请公布日期 2006.01.12
申请号 US20040889807 申请日期 2004.07.12
申请人 KANG SUNG G;BAE WOO K 发明人 KANG SUNG G.;BAE WOO K.
分类号 C23C16/00 主分类号 C23C16/00
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