发明名称 |
METHOD OF DETERMINING THE CORRECT AVERAGE BIAS COMPENSATION VOLTAGE DURING A PLASMA PROCESS |
摘要 |
<p>A method for removing a substrate that is attached to a bipolar electrostatic chuck (ESC) by application of a bipolar ESC voltage is provided which includes discontinuing the bipolar ESC voltage after processing a current substrate, and determining a monopolar component error of the processing. The method also includes correcting the monopolar component error for a subsequent substrate.</p> |
申请公布号 |
WO2006004744(A2) |
申请公布日期 |
2006.01.12 |
申请号 |
WO2005US22914 |
申请日期 |
2005.06.28 |
申请人 |
LAM RESEARCH CORPORATION;HOWALD, ARTHUR, M. |
发明人 |
HOWALD, ARTHUR, M. |
分类号 |
H02H1/00;H01L21/683 |
主分类号 |
H02H1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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