发明名称 THIN FILM DEPOSITION SYSTEM
摘要 PROBLEM TO BE SOLVED: To reduce the time required for temperature control in a substrate and to improve productivity and energy efficiency in a thermal decomposition type thin film deposition system. SOLUTION: In the thin film deposition system 10, a liquid raw material is thermally decomposed on a substrate 11 to deposit a thin film on the substrate 11. The thin film deposition system 10 is provided with: a heat source body 15 of feeding heat for thermal decomposition to the substrate 11; a nozzle 39 of atomizing a liquid raw material toward the substrate 11; and heat controllers 31, 35 of controlling heat conducted from the heat source body 15 to the substrate 11. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006009123(A) 申请公布日期 2006.01.12
申请号 JP20040191231 申请日期 2004.06.29
申请人 ISHIKAWAJIMA HARIMA HEAVY IND CO LTD 发明人 MATSUO KENGO;FUKUCHI YASUHIKO
分类号 C23C26/00 主分类号 C23C26/00
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