POSITIVE RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN

摘要

Disclosed is a positive resist composition containing a resin component (A) whose alkali solubility is changed by the action of an acid, and an acid generator component (B). The component (A) is composed of a resin component (A1) having a constitutional unit (a1) represented by the general formula (I) below and a constitutional unit (a3) having an acid-cleavable dissolution inhibiting group which is composed of a tertiary alkyl group, and a resin component (A2) having the constitutional unit (a1), the constitutional unit (a3), and a constitutional unit (a4) having a crosslinking group which is represented by the general formula (III) below. (I) (In the formula, R represents a hydrogen atom or a methyl group, and m represents an integer of 1-3.) (III) (In the formula, R<sup