| 摘要 |
PROBLEM TO BE SOLVED: To provide a thermal CVD (Chemical Vapor Deposition) system where, even in the case the size of a substrate is enlarged, the thickening of an infrared transmission window installed between a heating means and the substrate for maintaining its strength to the atmospheric pressure is prevented, and the increase of the cost can be suppressed. SOLUTION: The inside of a vacuum chamber 2 is separated into a side at which a substrate 5 is installed by a quartz glass 3 as an infrared penetration window and a side at which a plurality of infrared lamps 8 for heating the substrate 5 are installed; during a film deposition process, a gaseous mixture of carbon monoxide and gaseous hydrogen as a gaseous starting material is introduced into the lower chamber 2a in the chamber on the side of the substrate 5; further, gaseous argon as inert gas is introduced into the upper chamber 2b in the chamber on the side of the infrared lamps 8; and also, sluice valves 15, 19 are opened, and control is performed in such a manner that the pressure of the lower chamber 2a in the chamber and the pressure of the upper chamber 2b in the chamber are made almost the same. COPYRIGHT: (C)2006,JPO&NCIPI
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