发明名称 |
Monomers for photoresists bearing acid-labile groups of reduced optical density |
摘要 |
Monomers and polymers useful for forming photoresists are provided. More particularly, photoresists, as well as monomers and polymers for photoresists useful in micro-lithography, specifically monomers bearing acid-labile groups of reduced optical density. The resulting photoresists exhibit improved transparency to 157 nm light. The photoresist compositions are composed of a mixture of at least one water insoluble, acid decomposable polymer which is prepared from at least one monomeric unit which comprises an acid labile group of the formula -OC(CH<SUB>3</SUB>)<SUB>2</SUB>CF<SUB>3 </SUB>and which is substantially transparent to ultraviolet radiation at a wavelength of about 157 nm and at least one photoacid generator capable of generating an acid upon exposure to sufficient activating energy at a wavelength of about 157 nm.
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申请公布号 |
US2006008730(A1) |
申请公布日期 |
2006.01.12 |
申请号 |
US20040888732 |
申请日期 |
2004.07.09 |
申请人 |
PUY MICHAEL V D;NAIR HARIDASAN K;MA JINGJI;NALEWAJEK DAVID;POSS ANDREW J;STACHURA LEONARD M;FORD LAWRENCE A;LAVERY DENNIS M |
发明人 |
PUY MICHAEL V.D.;NAIR HARIDASAN K.;MA JINGJI;NALEWAJEK DAVID;POSS ANDREW J.;STACHURA LEONARD M.;FORD LAWRENCE A.;LAVERY DENNIS M. |
分类号 |
G03C1/492 |
主分类号 |
G03C1/492 |
代理机构 |
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