| 摘要 |
PROBLEM TO BE SOLVED: To provide a film-forming apparatus which can form a thin film with a wide range of desired thickness, and to provide a film-forming method. SOLUTION: The film-forming apparatus for forming the thin films on glass substrates 160A and 160B has targets 50 arranged so as to face the glass substrates 160A and 160B, and external holding frames 195A and 195B for tilting the glass substrates 160A and 160B against the targets 50 by a predetermined angle. The external holding frames 195A and 195B are arranged between the glass substrates 160A and 160B and substrate holders 140 for supporting the glass substrates 160A and 160B; and lift each one side of the glass substrates 160A and 160B. COPYRIGHT: (C)2006,JPO&NCIPI
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