Polymerizable fluorinated ester, manufacturing method, polymer, photoresist composition and patterning process

摘要

Polymerizable fluorinated ester compounds having formula (1) or (2) are novel wherein R¹ is H, methyl or trifluoromethyl, R² is a divalent hydrocarbon group, R³ is H or a monovalent hydrocarbon group, or R² and R³, taken together, may form a ring, R⁴ is H, OH or a monovalent hydrocarbon group, and R⁵ is an acid labile group. They are most useful as monomers to produce polymers for the manufacture of radiation-sensitive resist compositions.