| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide an improved method for designing an Levenson type phase shifting mask with which the phase shape collision within a design layout can be solved. <P>SOLUTION: The method of designing the Lvenson type phase shifting mask for projecting an image of an integrated circuit design is provided. Phase units are binary colorable within each unit of the hierarchical circuit design, e.g., cell, an array, a net, or array of nets and/or cells. The assignment of phases or colors within a hierarchical unit will be correctly binary colored to satisfy the lithographic, manufacturability and other design rules, referred to collectively as coloring rules. During assembly with other units, the coloring of phases in a hierarchical unit may change (e.g., be reversed or flipped), but the correct binary colorability of a hierarchical unit is preserved, which simplifies assembly of the integrated circuit layout. <P>COPYRIGHT: (C)2006,JPO&NCIPI</p> |
