| 发明名称 |
ION IMPLANTER OPERATING IN PULSED PLASMA MODE |
| 摘要 |
<p>The invention relates to an ion implanter (IMP) comprising a pulsed plasma source (SPL), a substrate support plate (PPS) and a power supply (ALT) for said plate. The inventive implanter also comprises a capacitor C which is connected directly to the earth (E) and which is mounted downstream of the plate power supply (ALT). The invention also relates to a method of using said implanter.</p> |
| 申请公布号 |
WO2006003322(A2) |
申请公布日期 |
2006.01.12 |
| 申请号 |
WO2005FR01468 |
申请日期 |
2005.06.14 |
| 申请人 |
ION BEAM SERVICES;TORREGROSA FRANK;MATHIEU GILLES;ROUX LAURENT |
发明人 |
TORREGROSA FRANK;MATHIEU GILLES;ROUX LAURENT |
| 分类号 |
C23C8/36;C23C14/48;C23C16/00;H01J37/32;(IPC1-7):C23C14/48 |
主分类号 |
C23C8/36 |
| 代理机构 |
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| 主权项 |
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