SUBSTRATE DEVICE WITH HIGH REFLECTIVE RATE AND METHOD FOR PRODUCING THE SAME,申请号KR20040052172-传众专利搜索

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发明名称	SUBSTRATE DEVICE WITH HIGH REFLECTIVE RATE AND METHOD FOR PRODUCING THE SAME
摘要
申请公布号	KR20060003387(A)	申请公布日期	2006.01.11
申请号	KR20040052172	申请日期	2004.07.06
申请人	ALTI-ELECTRONICS CO., LTD.	发明人	PARK, IK SEONG
分类号	H01L33/60	主分类号	H01L33/60
代理机构		代理人
主权项
地址

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