发明名称 |
A method of producing high aspect ratio domes by vapor deposition |
摘要 |
<p>An apparatus and method for preparing high aspect ratio domes employed to enhance aerodynamic performance in missiles and aircraft. The apparatus and method of the present invention also provide transmissive domes for infrared sensors used for navigation, targeting and guidance systems. The apparatus is employed in chemical vapor deposition furnaces for chemical deposition of materials on mandrels to form domes. The mandrels of the apparatus are arranged in the deposition chamber such that the flow of gaseous reactants does not impinge on the mandrels. The reactants diffuse onto the mandrels to form domes with high aspect ratios.</p> |
申请公布号 |
EP1193324(A3) |
申请公布日期 |
2006.01.11 |
申请号 |
EP20010306564 |
申请日期 |
2001.07.31 |
申请人 |
SHIPLEY COMPANY LLC |
发明人 |
GOELA, JITENDRA S.;SALIHBEGOVIC, ZLATKO |
分类号 |
C23C16/455;C23C16/01;C23C16/44;C23C16/458;(IPC1-7):C23C16/00;C23C16/32 |
主分类号 |
C23C16/455 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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