发明名称
摘要 PURPOSE: A radiation sensitive resin composition is provided, which is excellent in radiation sensitivity and developing time. And an insulating membrane in terms and a microlens are provided, which are produced by using the radiation sensitive resin composition and are excellent in an adhesive property, a solvent-resistance, and etc. CONSTITUTION: The radiation sensitive resin composition contains: a copolymer of an unsaturated carboxylic acid and/or an unsaturated carboxylic anhydride, an epoxy containing unsaturated compound, and an olefin-based unsaturated compound; a condensate of a specific phenol compound and 1,2-naphthoquinone diazide sulfonic acid halide, wherein the specific phenol compound is at least one selected from 2-methyl-2-(2,4-dihydroxyphenyl)-4-(4-hydroxyphenyl)-7-hydroxychromane, 2-£bis{(5-isopropyl-4-hydroxy-2-methyl)phenyl}methyl|phenol, and etc. And the insulating membrane in terms and the microlens are produced by a process containing the steps of: forming a film of the radiation sensitive resin composition on a substrate; irradiating a radiation on at least one part of the film; developing; heating.
申请公布号 JP3733946(B2) 申请公布日期 2006.01.11
申请号 JP20020334547 申请日期 2002.11.19
申请人 发明人
分类号 G03F7/033;C08G59/62;G02B3/00;G03F7/022;G03F7/027;G03F7/40;H01L21/027 主分类号 G03F7/033
代理机构 代理人
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