发明名称 Projection system for EUV lithography
摘要 The invention includes an EUV optical projection system, comprising: at least six mirrors (M1, M2, M3, M4, M5, M6) for imaging an object (OB) to an image (IM) and wherein an aperture stop (APE) is located along an optical path from said object (OB) to said image (IM) between a first mirror (M1) and a second mirror (M2) and wherein said second mirror (M2) is convex.
申请公布号 EP1615076(A1) 申请公布日期 2006.01.11
申请号 EP20050021103 申请日期 2002.01.04
申请人 CARL ZEISS SMT AG 发明人 MANN, HANS-JUERGEN;HUDYMA, RUSSELL
分类号 G03F7/20 主分类号 G03F7/20
代理机构 代理人
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