Chemical mechanical polishing equipment for semiconductor device manufacture,申请号KR20020067019-传众专利搜索

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发明名称	Chemical mechanical polishing equipment for semiconductor device manufacture
摘要
申请公布号	KR100541706(B1)	申请公布日期	2006.01.11
申请号	KR20020067019	申请日期	2002.10.31
申请人		发明人
分类号	H01L21/304	主分类号	H01L21/304
代理机构		代理人
主权项
地址

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