СПОСОБ НАНЕСЕНИЯ ОКСИДНЫХ ПЛЕНОК

摘要

FIELD: thin-film technology, possibly procedures for applying films in microelectronics, nano-electronics and opto-electronics with use of magnetron, electron beam and other methods. ^ SUBSTANCE: method comprises steps of supplying to growth surface metal flow and applying film simultaneously from two targets by magnetron method; using as one target ceramic on base of metal oxide and using the metal itself as other target. ^ EFFECT: improved structure of crystalline layers due to creation of practically equilibrium condition for depositing films in the result of forming uniform layers without column-structure zones. ^ 2 cl