发明名称 |
Method of patterning a mask blank |
摘要 |
A light-block film is formed on a substrate, and a chemically amplified resist film is then formed on the light-block film. The chemically amplified resist film includes a photosensitive acid generator which generates an acid upon irradiation with activating light or radiation, and mainly contains a first resin that becomes soluble in bases by action of the acid. Next, a protective film is formed on the chemically amplified resist film and thereby yields a mask blank. The protective film is formed by dissolving a second resin and the photosensitive acid generator in a solvent that does not substantially dissolve the chemically amplified resist film to prepare a solution, and applying the solution to the chemically amplified resist film. |
申请公布号 |
US6984473(B2) |
申请公布日期 |
2006.01.10 |
申请号 |
US20020217466 |
申请日期 |
2002.08.14 |
申请人 |
MITSUBISHI DENKI KABUSHIKI KAISHA |
发明人 |
KUMADA TERUHIKO;FUJINO ATSUKO;MAETOKO KAZUYUKI |
分类号 |
G03F1/00;G03F7/039;G03C5/00;G03F1/08;G03F1/14;G03F1/50;G03F1/54;G03F7/11;H01L21/027 |
主分类号 |
G03F1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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