USE OF SPIN-ON, PHOTOPATTERNABLE, INTERPLAYER DIELECTRIC MATERIALS AND INTERMEDIATE SEMICONDUCTOR DEVICE STRUCTURE UTILIZING THE SAME

摘要

A cap layer that enables a photopatternable, spin-on material to be used in the formation of semiconductor device structures at wavelengths that were previously unusable. The photopatternable, spin-on material is applied as a layer to a semiconductor substrate. The cap layer and a photoresist layer are each formed over the photopatternable layer. The cap layer absorbs or reflects radiation and protects the photopatternable layer from a first wavelength of radiation used in patterning the photoresist layer. The photopatternable, spin-on material is convertible to a silicon dioxide- based material upon exposure to a second wavelength of radiation.