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发明名称
MODIFIED APERTURE IN EXPOSURE EQUIPMENT FOR SEMICONDUCTOR DEVICE FABRICATION
摘要
申请公布号
KR20060000926(A)
申请公布日期
2006.01.06
申请号
KR20040049918
申请日期
2004.06.30
申请人
HYNIX SEMICONDUCTOR INC.
发明人
PARK, CHAN HA;HONG, JONG KYUN
分类号
H01L21/027;G03F7/20
主分类号
H01L21/027
代理机构
代理人
主权项
地址
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