| 摘要 |
A mask pattern, provided on a transmitting substrate (2), comprises a semi-light-shielding portion (3) for passing an exposure light in phase with a translucent portion (4) as a reference, and a phase shifter (5) for passing an exposure light in opposite phase with the translucent portion (4) as a reference. The semi- light-shielding portion (3) has a transmittance to allow exposure light to pass partially. The phase shifter (5) is provided at a position capable of partially canceling, by its transmitted light, light passed through the translucent portion (4) and the semi-light-shielding portion (3). |
