发明名称 MANUFACTURING METHOD OF SUBSTRATELESS FILTER
摘要 PROBLEM TO BE SOLVED: To provide a manufacturing method of substrateless filter capable of manufacturing a substrateless filter without limitation of the size. SOLUTION: A strippable layer 20 comprising fullerene is formed on a glass substrate 10. Subsequently, a multilayer 30 is formed on the strippable layer 20 according to sputtering. Thereafter, a glass substrate 10 on which the multilayer film 30 is formed via the strippable layer 20 is heated at 400°C in vacuum for 2 hr. As a result, the fullerene forming the strippable layer 20 is sublimated and the multilayer film 30 is separated from the substrate 10. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006003684(A) 申请公布日期 2006.01.05
申请号 JP20040180630 申请日期 2004.06.18
申请人 NIKON CORP 发明人 SUZUKI MASASHI
分类号 G02B5/28 主分类号 G02B5/28
代理机构 代理人
主权项
地址