发明名称 VACUUM FILM FORMING DEVICE, MANUFACTURING METHOD OF THIN FILM ELEMENT, AND ELECTRONIC EQUIPMENT
摘要 PROBLEM TO BE SOLVED: To provide a compact vacuum film-forming device in which the atmosphere in the film-forming chamber can be decompressed rapidly by making the volume of the film-forming chamber small, a manufacturing method of a thin film element, and an electronic equipment. SOLUTION: The film-forming device comprises a gate valve GB at each of the first to third evaporation source chambers 3A-3C for making it independent from the substrate transfer chamber 2. Furthermore, an intake and exhaust port 12 is provided at each of the first to third evaporation source chambers 3A-3C, and from it it is connected to a vacuum pump which decompresses or controls to atmospheric pressure the atmosphere in each of the first to third evaporation source chambers 3A-3C individually through the piping. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006004706(A) 申请公布日期 2006.01.05
申请号 JP20040178379 申请日期 2004.06.16
申请人 SEIKO EPSON CORP 发明人 KURAUCHI NOBUYUKI
分类号 H05B33/10;C23C14/12;H01L51/50 主分类号 H05B33/10
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