| 摘要 |
PROBLEM TO BE SOLVED: To provide an electron microscope which can alleviate a burden inflicted on an operator in order to perform an appropriate observation, especially, to suppress contamination of a testpiece and contraction of pattern. SOLUTION: When irradiation of electron beams is started, a warning value comparison part 5 compares a warning value inputted in a warning value input part 3 with the accumulation dose amount measured by a dose measuring part 1, and an allowed value comparison part 4 compares the accumulation dose amount with an allowed value inputted in an allowed value input part 2. As a result of these comparisons, when the accumulation dose amount has reached the warning value, a warning part 8 issues a warning that the accumulation dose amount is close to the allowed value, and when there exits an area where the accumulation dose amount has reached the allowed value, an information part 6 informs to that effect. Then, when there exists an area where the accumulation dose amount has reached the allowed value, an irradiation shut-off part 7 shuts off irradiation of electron beams on that area. Especially, when the accumulation dose amount has reached the allowed value as a whole of the chip, an irradiation object changing part 9 performs control of a stage or the like so that the electron beams may be irradiated on the other chips. COPYRIGHT: (C)2006,JPO&NCIPI
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