发明名称 Photodetector using mosfet with quantum channel and manufacturing method thereof
摘要 The present invention relates to a photodetector using MOSFET with quantum channels and a method for making thereof. A photodetector using MOSFET with quantum channels according to the present invention comprises a quantum channel formed on an activated SOI wafer, a gate oxide film covering said quantum channel; a gate formed so as to control carrier current at said quantum channel; a source and a drain formed at both ends of said channel area; and metal layers connected with said gate, said source and said drain. Thus, the photodetector according to the present invention can obtain more excellent photocurrent characteristics compared with the existing SOI MOSFET device by forming quantum channels on the SOI MOSFET. The MOSFET with quantum channels according to the present invention can be used as a good photodetector maintaining advantages of the existing MOSFET such as ease in integration and high speed.
申请公布号 US2006001096(A1) 申请公布日期 2006.01.05
申请号 US20050530416 申请日期 2005.04.07
申请人 KOREA ELECTRONICS TECHNOLOGY INSTITUTE 发明人 CHOI HONG G.;KIM HOON
分类号 H01L27/01;H01L29/78;H01L31/10;H01L31/113 主分类号 H01L27/01
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