发明名称 |
METHOD FOR FORMING PATTERN, AND TFT ARRAY SUBSTRATE, AND LIQUID CRYSTAL DISPLAY ELEMENT |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for forming a pattern suitable for the manufacture of a liquid crystal display (LCD) or a plasma display (PDP) for a large screen, and to provide a TFT array substrate and a liquid crystal display element. <P>SOLUTION: The method includes: a positive photosensitive layer forming step to form at least a positive photosensitive layer on the surface of a substrate by using a positive photosensitive composition; an exposure step to expose the positive photosensitive layer to light from a light irradiating means, the light modulated by a light modulating means having n of drawing elements which receive the light from the light irradiating means and exit the light and then made to pass a microlens array having arrangement of microlenses having aspheric surfaces which can correct aberration due to the exiting faces of the drawing elements; and a developing step to develop the positive photosensitive layer exposed in the exposure step. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
申请公布号 |
JP2006003422(A) |
申请公布日期 |
2006.01.05 |
申请号 |
JP20040177159 |
申请日期 |
2004.06.15 |
申请人 |
FUJI PHOTO FILM CO LTD |
发明人 |
IWASAKI MASAYUKI;OZAKI TAKAO |
分类号 |
G03F7/20;G02F1/13;G02F1/1362;G03F7/022;H01L21/027 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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