| 摘要 |
<P>PROBLEM TO BE SOLVED: To stably form a resist pattern with high resolution. <P>SOLUTION: An aligner 100 is provided with an optical source 101 irradiating a mask 102 with light, a projection optical system 103 projecting the image of the mask 102 on a wafer 110 and a liquid supply device 105 filling a part between the projection optical system 103 and the wafer 110 with medium liquid 109. Saturation cyclic hydrocarbon or its dielectric is used as medium liquid 109. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
