| 摘要 |
A chemical-amplification type silicone-based positive-working resist composition that can be prepared from compounds of good availability as the base materials through simple means and can provide a bilayer resist material from which a fine pattern of high resolution, high aspect ratio, desirable cross-sectional profile and low line edge roughness can be formed. In particular, a chemical-amplification type positive-working resist composition comprising an alkali soluble resin (A) and a photoacid generator (B) wherein a ladder-type silicone copolymer comprising (hydroxyphenylalkyl)silsesquioxane units (a<SUB>1</SUB>), (alkoxyphenylalkyl)silsesquioxane units (a<SUB>2</SUB>) and alkyl- or phenylsilsesquioxane units (a<SUB>3</SUB>) is used as the alkali soluble resin (A). The copolymer wherein, in the component (A), the units (a<SUB>3</SUB>) are phenylsilsesquioxane units is a novel compound.
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