| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method of easily adjusting the landing angle on the reticle of the illumination light from an illumination optical system, in a charged particle beam exposure system based on an image partitioning exposure and transfer-method. <P>SOLUTION: Graphs in the figure show a relationship between an increase or decrease of deflection amount of a deflector and an electric current of charged particle beams absorbed from a scattered beam absorption opening. The graph (a) is one when the charged particle beams passing through the reticle cross the optical axis at the scattered beam absorption opening. The graph is symmetrical about the position where the deflection amount newly added to the deflector is zero. Using this property by adjusting the illumination optical system so as to obtain the state shown in the graph (a), the illumination light can be incident into the reticle at right angles, with the landing angle on the reticle being zero. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
