摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a manufacturing method capable of easily forming an electron emission element with excellent shape quality and electron emission capacity of a fine projection by using a low energy process by forming a fine projection by using optimal material for shape formation with fine particles as a mask and forming a material having excellent electron emission capacity after removing the fine particles used as the mask, to provide the electron emission element obtained by this method, and to provide a high quality electron emission element capable of low-voltage drive and easily coping with a large area and with excellent uniformity and stability by obtaining a regular fine projection with sufficient controllability by a simple process. <P>SOLUTION: This manufacturing method comprises a process regularly arranging the fine particles made of a first material on a substrate two-dimensionally, a process filling second material and hardening it in a space formed by the substrate and the fine particles, a process removing the fine particles, and a process form a conductive material or a semiconductor material in a film on the surface of the material obtained by the hardening process. <P>COPYRIGHT: (C)2006,JPO&NCIPI</p> |