| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a single crystal MgO sintered compact used as a target material for depositing an MgO film on a substrate using an electron beam deposition method, without reducing the density and spatter resistance of the obtained MgO film, which has excellent film properties, and, when used, e.g., as a PDP (Plasma Display Panel) protective film, has improved discharge properties or the like, to provide a method for producing the single crystal MgO sintered compact, and to provide a PDP protective film obtained by using the single crystal MgO sintered compact as a target material. <P>SOLUTION: The single crystal magnesium oxide sintered compact has a relative density of 50 to <90%, has a magnesium oxide purity of ≥97 mass%, and also comprises coarse grains with a grain size of ≥200 μm. The protective film for a plasma display panel is produced by an electron beam deposition method, an ion irradiation deposition method, or a sputtering method using the single crystal magnesium oxide sintered compact as a target material. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
