| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for manufacturing a test mask, having several kinds of transmittances and patterns that have different dimensions at various kind of transmittance, and to provide a method for controlling the detection sensitivity of a defect inspection apparatus that uses the test mask. <P>SOLUTION: The test mask has several kinds of transmittances and patterns having different dimensions at each kind of transmittance. The manufacturing method of the test mask includes steps of forming a pattern of a light shielding film on a glass substrate and of changing the film thickness of the light-shielding film in the pattern, wherein the step of changing the film thickness of the light-shielding film is repeated to produce a test mask. The patterns of the test mask are transferred onto a wafer; the certified defect dimension of each kind of defects is determined; and the detection sensitivity of the defect inspection apparatus, with respect to a semitransparent defect, is controlled by using the test mask in the defect inspecting apparatus. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
