| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a position measuring device, or the like capable of suppressing a frequency for changing a wide visual field sensor and a narrow one in the position measuring device for detecting a mark by changing the wide visual field sensor and the narrow one. <P>SOLUTION: A first measurement system 51 is used to observe a pattern RAM formed on a mask R, and correspondingly stores the position information of the pattern RAM with identification information for identifying the mask R. And a second measurement system 52 (52X, 52Y), which has a measurement visual field that is narrower than that of the first measurement system 51, is used to observe the pattern RAM by a measurement magnification that is higher than that of the first measurement system 51. And the pattern RAM on the prescribed mask R is measured by the first measurement system 51 after the position relationship between the measurement visual field of the second measurement system 52 and the pattern RAM is determined, on the basis of the position information corresponding to the information when the existence of the identification information regarding the prescribed mask R is recognized in the stored information. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
