| 摘要 |
<P>PROBLEM TO BE SOLVED: To reliably load or unload a substrate to or from a chuck when suspending the substrate from a stage device for retaining the substrate for a substrate-carrying device for carrying the substrate, such as a reticle, a wafer, and a mask, in a projection aligner. <P>SOLUTION: There are provided: the chuck that is arranged on a stage and has a chucking surface for chucking the substrate downward; a carrier arm for carrying in or out the substrate from the lower side of the chuck; a biasing means that is arranged at a carrier arm side and elastically presses the substrate onto the chucking surface when the substrate is chucked by or separated from the chuck; and an extrusion mechanism that is arranged in the chuck and extrudes the substrate to the carrier arm side when the substrate is separated from the chuck. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
