发明名称 METHOD FOR MANUFACTURING DEVICE IN PHOTOLITHOGRAPHY LINE
摘要 <P>PROBLEM TO BE SOLVED: To provide a method for manufacturing a device by which the productivity of a panel can be improved by stabilizing the arrangement accuracy of panels of all substrate in a cassette and production lines can be operated without lowering throughput in a photolithography line for manufacturing liquid crystal panels or the like through a plurality of connected exposure devices. <P>SOLUTION: In the photolithography line with a plurality of connected exposure devices, all substrates in one cassette are exposed in the same exposure device. In case when a plurality of cassettes are put into the photolithography line, substrates in the cassettes are fed into the line at the same time, and all substrates in one cassette are controlled to be exposed in the same exposure device. <P>COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006005284(A) 申请公布日期 2006.01.05
申请号 JP20040182329 申请日期 2004.06.21
申请人 CANON INC 发明人 TAKAHASHI HIROYUKI;EKOSHI YUKIHISA
分类号 H01L21/027;G03F7/20 主分类号 H01L21/027
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