COMPOUND, POLYMER COMPOUND, POSITIVE TYPE RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN

摘要

PROBLEM TO BE SOLVED: To provide a polymer compound capable of constituting a positive type resist pattern having excellent resolution and capable of favorably resolving a resist pattern even by using an acid generating agent having weak strength of an acid generated, a compound suitable for producing the polymer compound and a positive type resist composition containing the polymer compound and to provide a method for forming resist pattern by using the positive type resist composition.

SOLUTION: The compound is represented by general formula (1). The polymer compound comprises a unit (a1) represented by general formula (11). The positive type resist composition comprises the polymer compound. The method for forming resist pattern comprises using the positive type resist composition.

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