| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a pattern forming material capable of efficiently forming a permanent pattern such as a wiring pattern free of defects with high definition by suppressing the distortion of an image formed on the pattern forming material and adjusting the refractive index difference between fine particles and a synthetic resin film of a support of the pattern forming material to a predetermined range, and to provide a pattern forming apparatus with the pattern forming material and a pattern forming method using the pattern forming material. <P>SOLUTION: The pattern forming material has a photosensitive layer on a support having a synthetic resin film containing fine particles, wherein the refractive index difference between the fine particles and the synthetic resin film is ≤0.3. The pattern forming method includes at least exposing the photosensitive layer of the pattern forming material to light from a light irradiation device after the light is modulated by a light modulator and passed through a microlens array, wherein the light modulator has (n) imaging portions which receive light from the light irradiation device and output the light, and wherein the microlens array is fabricated by arraying microlenses having aspherical surfaces capable of making corrections for aberration due to the distortion of output surfaces of the imaging portions. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
