| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for controlling a pattern XY unbalanced magnification correction by a mask that is easily mounted on an X-ray exposure device. <P>SOLUTION: In this method, loads are imposed on a mask structure consisting of a mask substrate provided with a rectangular window, wherein a mask pattern is formed on a thin film and a frame, in the in-surface directions and in the out-of-surface directions as to the front and rear surfaces of the mask structure. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
