| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a means and a method for detecting the position of a light shield plate which is changed by thermal expansion with high precision wherein the means and the method are unsusceptible to thermal expansion. <P>SOLUTION: This projection aligner for illuminating an original pattern by light flux from a light source and projecting the pattern to the surface of a substrate by a projection optical system has the light shield plate for limiting the illuminated region of the original pattern, a detecting means for detecting the expansion amount of the light shield plate, and the positioning of the light shield plate based on the output of the detecting means. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
