| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an electron beam lithographic apparatus which does not leak the electron beam during blanking. <P>SOLUTION: The apparatus comprises an electron gun for radiating an electron beam, an aperture having various types of shaping holes for shaping the electron beam, a shaping defector or collective defector for deflecting the electron beam toward a selected shaping hole, an object restriction for restricting the pass of the electron beam while no electron beam is radiated on a sample, and a blanking means for deflecting the electron beam so that the restricting means blocks the electron beam. The deflecting direction of the blanking means is changed according to the off-axis direction of the electron beam due to the transient deflection voltage of the shaping or collective deflection. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
