ELECTRON BEAM DEVICE AND DEVICE MANUFACTURING METHOD USING THE SAME

摘要

PROBLEM TO BE SOLVED: To provide an electron beam device capable of evaluating a sample with high throughput by using an objective lens having a small aberration. SOLUTION: The electron beam device scans a sample by converging a plurality of primary electron beams using the objective lens and detects secondary electron beams emitted from the sample to thereby evaluate the sample. The device comprises: a plurality of openings 6 to be irradiated with an electron beam from an electron gun EG; an NA opening 7; a reducing lens 8; the objective lens 9 having an electromagnetic lens with a pole gap 14 formed on the side of the sample 10; a deflector 12 for electron beam scanning; a separator 13 for separating the secondary electron beams from the primary electron beams; and a plurality of secondary beam detectors 20 for detecting the secondary electron beams. COPYRIGHT: (C)2006,JPO&NCIPI