| 摘要 |
PROBLEM TO BE SOLVED: To provide a vapor deposition apparatus capable of preventing separation of deposits on a shutter and coverage of an upper portion of a vapor deposition source, a vapor deposition method, an organic EL apparatus, and electronic equipment. SOLUTION: The vapor deposition apparatus to deposit a film on a vapor deposition surface of a substrate by vaporizing a vapor deposition material by a vapor deposition source has a shutter to regulate the vapor deposition rate in a vicinity of an aperture of the vapor deposition source, and very small irregularities are formed on a surface of the shutter on the vapor deposition source side. COPYRIGHT: (C)2006,JPO&NCIPI
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