| 摘要 |
PROBLEM TO BE SOLVED: To provide a plasma etching method for forming an inclined structure to a machined plate which is a key point in manufacturing a micromachine, in a short time at a low cost with fewer processes. SOLUTION: In plasma etching, a potential gradient on a substrate is vertical to the substrate. When the machined plate 3 with a narrow width is placed at a certain angle on the substrate 1, the potential gradient influenced by both the substrate to be a base, and the machined plate placed on the substrate is generated. Since ion is incident to the machined plate along the electric field gradient, etching progresses in an inclined direction to the machined plate. Using this, an inclined structure 7 is obtained. COPYRIGHT: (C)2006,JPO&NCIPI
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