Photothermographic material, development method and thermal development device thereof

摘要

A thermal development device including: a thermal development section for heating to develop a latent image formed on a light-sensitive surface of a photothermographic material; a cooling section for cooling the photothermographic material passed the thermal development section under a condition that a cooling rate for a light-insensitive surface of the photothermographic material is faster than the cooling rate for the light-sensitive surface of the photothermographic material; and a conveyance section in which the photothermographic material is conveyed via the thermal development section and the cooling section, and the length of the conveyance path that passes the cooling section is not more than 1.5 times the length of the conveyance path that passes the thermal development section.