发明名称 |
Nano-structure and method of fabricating nano-structures |
摘要 |
In one embodiment, a method for fabricating a nano-structure includes forming a feature on a substrate, depositing multiple layers of material over the substrate and feature to form a multi-layer stack, depositing a film over the multi-layer stack, removing a portion of the film and the multi-layer stack to expose edges of the layers of material, and removing portions of the layers of material to form trenches at a surface of the nano-structure.
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申请公布号 |
US2006003267(A1) |
申请公布日期 |
2006.01.05 |
申请号 |
US20050215985 |
申请日期 |
2005.08.31 |
申请人 |
RAMAMOORTHI SRIRAM;MARDILOVICH PETER;KORNILOVICH PAVEL;KORTHUIS VINCENT C |
发明人 |
RAMAMOORTHI SRIRAM;MARDILOVICH PETER;KORNILOVICH PAVEL;KORTHUIS VINCENT C. |
分类号 |
G03C5/00;C23C4/12;C23C4/18;C30B29/68;G03F7/00;G03F7/40;H01L21/00;H01L21/48;H01L21/768;H05K3/20 |
主分类号 |
G03C5/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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