| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an aligner capable of simultaneously observing a plurality of alignment marks irrespective of the size of a pattern region depending on the device, and capable of designing a reticle without being bound by the arrangement places of the alignment marks. <P>SOLUTION: This aligner comprises a projection optical system for projecting a pattern on a first object onto a second object with exposure light; a plurality of measuring devices for illuminating the alignment marks on the second object in a place different from the exposure position of the second object with detection light having a wavelength different from that of the exposure light, detecting the positional information of the marks, and relatively aligning the first and the second objects; and a means for detecting and correcting the deformation of each pattern region of the second object resulting from the heat treatment during a semiconductor device process, and at least one of the measuring devices has a movable means. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
