| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure method and an exposure apparatus capable of shortening time regarding the partial movement of an observation system for mark measurement and increasing throughput. <P>SOLUTION: The observation systems 22A, 22B include movement members 30A, 30B capable of freely moving between a measurement position Pa for measurement and a retraction position Pb apart from the measurement position, and move the movement members 30A, 30B between the measurement and retraction positions Pa and Pb. On the basis of information on a region to be irradiated with light on a mask R to be transferred onto a substrate by emitting illumination light IL, a movement distance when the movement members 30A, 30B are retracted and moved is calculated. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
