| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photosensitive resin composition having high transparency, ensuring a proper edge shape of a pattern, and that is suitable for color filter which acquires high reliability. <P>SOLUTION: The alkali-developable photosensitive resin composition comprises (A) an unsaturated-group-containing alkali-soluble resin compound obtained by reacting a reaction product of an epoxy compound having two glycidyl ether groups derived from bisphenol represented by Formula (1) and (meth)acrylic acid with a saturated acid anhydride and a saturated acid dianhydride, (B) a photopolymerizable monomer having an ethylenically unsaturated bond, (C) a photopolymerization initiator or a sensitizer, and (D) a compound having an epoxy group. In the Formula (1), R<SB>1</SB>-R<SB>4</SB>each denotes H, alkyl, halogen or phenyl; R<SB>5</SB>denotes H or methyl; A denotes -CO-, -SO<SB>2</SB>-, -C(CF<SB>3</SB>)<SB>2</SB>-, -Si(CH<SB>3</SB>)<SB>2</SB>-, -CH<SB>2</SB>-, -C(CH<SB>3</SB>)<SB>2</SB>-, -O-, 9,9-fluorenyl or direct bond; X, Y<SB>1</SB>and Y<SB>2</SB>each denotes a saturated carboxylic acid residue or H; and n denotes a number of 1-20. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
