发明名称 |
MANUFACTURING METHOD OF FINE STRUCTURE AND MANUFACTURING DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To provide a new manufacturing method and a new manufacturing device manufacturable with arbitrary materials and crystallinity while controlling a position and a size freely in the fine structure of the same size (nanometer order) with an object manufactured by a gas deposition method using an electron ray. SOLUTION: After irradiating an electron ray toward a desired position on a material and forming a mask while passing on the material the gas containing elements used as the materials of the mask, micro-processing is performed to the material so that materials other than the portion covered with the mask may be removed by irradiating an energy beam. COPYRIGHT: (C)2006,JPO&NCIPI
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申请公布号 |
JP2006005110(A) |
申请公布日期 |
2006.01.05 |
申请号 |
JP20040179071 |
申请日期 |
2004.06.17 |
申请人 |
NATIONAL INSTITUTE FOR MATERIALS SCIENCE |
发明人 |
MITSUISHI KAZUKI;SHIMOJO MASAYUKI;TANAKA MIYOKO;FURUYA KAZUO |
分类号 |
H01L21/302;B82B3/00;G01N1/28;G01N1/32;G01Q60/10;G01Q60/16;H01J37/30;H01J37/305;H01L21/3213 |
主分类号 |
H01L21/302 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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