发明名称 Apparatus to vary dimensions of a substrate during nano-scale manufacturing
摘要 The present invention is directed toward a system to vary dimensions of a substrate, such as a template having a patterned mold. To that end, the system includes a substrate chuck adapted to position the substrate in a region; a pliant member; and an actuator sub-assembly elastically coupled to the substrate chuck through the pliant member. The actuator assembly includes a plurality of lever sub-assemblies, one of which includes a body lying in the region and spaced-apart from an opposing body associated with one of the remaining lever sub-assemblies of the plurality of lever sub-assemblies. One of the plurality of lever assemblies is adapted to vary a distance between the body and the opposing body. In this manner, compressive forces may be applied to the template to remove unwanted magnification or other distortions in the pattern on the mold. The pliant member is configured to attenuate a magnitude of resulting forces sensed by the substrate chuck generated in response to the compressive forces.
申请公布号 US2006001857(A1) 申请公布日期 2006.01.05
申请号 US20050142839 申请日期 2005.06.01
申请人 MOLECULAR IMPRINTS, INC. 发明人 CHERALA ANSHUMAN;CHOI BYUNG-JIN;NIMMAKAYALA PAWAN K.;MEISSL MARIO J.;SREENIVASAN SIDLGATA V.
分类号 G03B27/58 主分类号 G03B27/58
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