发明名称 Removing a high-k gate dielectric
摘要 A metal oxide layer on a substrate is converted at least partly to a metal layer. At least part of the metal layer is covered by an oxidation resistant cover. The covered layer and underlying metal may be removed, for example, using acid.
申请公布号 US2006003499(A1) 申请公布日期 2006.01.05
申请号 US20040882733 申请日期 2004.06.30
申请人 DOCZY MARK L;NORMAN ROBERT L;BRASK JUSTIN K;KAVALIEROS JACK;METZ MATTHEW;DATTA SUMAN;CHAU ROBERT S 发明人 DOCZY MARK L.;NORMAN ROBERT L.;BRASK JUSTIN K.;KAVALIEROS JACK;METZ MATTHEW;DATTA SUMAN;CHAU ROBERT S.
分类号 H01L21/335;H01L21/425;H01L21/44 主分类号 H01L21/335
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